Overview
Titanium monoxide (TiO) sputtering targets are specialized materials used in physical vapor deposition (PVD) systems to create thin films with unique electrical and optical properties. These targets are manufactured through powder metallurgy or arc-casting processes to achieve the required density and microstructure. As a non-stoichiometric compound, TiO targets offer distinct advantages over pure titanium or titanium dioxide targets, particularly in applications requiring conductive oxide films. The material's properties make it valuable for both industrial coating processes and advanced research in materials science.
Physical and Chemical Properties
TiO sputtering targets exhibit a rock salt crystal structure with notable electrical conductivity (approximately 1×10³ S/cm), distinguishing them from insulating TiO₂. The material maintains stability under vacuum conditions but may oxidize in air at elevated temperatures. Key mechanical properties include a Vickers hardness of approximately 9 GPa and thermal expansion coefficient of 9.2×10⁻⁶/°C. These characteristics influence target performance during sputtering, affecting factors such as deposition rate and film uniformity. The targets typically display 95-98% of theoretical density to ensure optimal sputtering performance.
Main Applications
Primary industrial uses include decorative coatings for watches and jewelry, where TiO films create durable, colored surfaces through interference effects. In semiconductor manufacturing, TiO serves as a diffusion barrier layer in microelectronics. Emerging applications include photovoltaic devices and electrochromic windows, where the material's tunable optical properties prove valuable. Research laboratories utilize TiO targets for investigating novel oxide semiconductor materials and developing next-generation electronic devices.
Safety and Storage
TiO targets require careful handling to prevent surface contamination and structural damage. Store in argon-filled containers or vacuum-sealed packaging to minimize oxidation. Moisture exposure can lead to surface degradation affecting sputtering performance. When machining or handling targets, use appropriate dust control measures as fine particles may cause respiratory irritation. Implement standard metalworking safety protocols including local exhaust ventilation and personal protective equipment during target installation in sputtering systems.
B2B Procurement Guide
Industrial buyers should specify target dimensions (typically 1-8 inch diameters, 3-10mm thickness), purity (standard 99.9% or high purity 99.995%), and bonding requirements (backing plate material if applicable). Surface roughness (usually Ra < 5μm) significantly affects film quality. Lead times for custom targets range from 4-8 weeks. Consider requesting sputtering performance data including deposition rate curves and film property characteristics. For high-volume procurement, establish quality control protocols for lot-to-lot consistency in composition and density.
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