Overview
Sputtering nickel oxide (NiO) target is a specialized material used in physical vapor deposition (PVD) processes to create thin films. These films are essential in various high-tech applications, including semiconductors, solar cells, and smart glass. The target is typically made from high-purity nickel oxide powder, pressed and sintered into a dense form suitable for sputtering. Nickel oxide targets are favored for their consistent performance and ability to produce uniform films with precise stoichiometry. The material's properties, such as its bandgap and electrical characteristics, make it particularly valuable in optoelectronic and energy storage devices.
Physical and Chemical Properties
Nickel oxide (NiO) is a transition metal oxide with a cubic crystal structure. It exhibits p-type semiconductor behavior due to nickel vacancies, which act as charge carriers. The material has a high melting point of 1955°C, making it stable under high-temperature processing conditions. Chemically, NiO is relatively inert but can react with strong acids. Its insolubility in water and most organic solvents makes it suitable for various deposition environments. The density of NiO is 6.67 g/cm³, contributing to its durability as a sputtering target.
Main Applications
The primary use of sputtering nickel oxide targets is in the production of thin films for semiconductor devices, where they serve as dielectric or resistive layers. In electrochromic devices, NiO films enable smart windows that change transparency in response to electrical signals. Another significant application is in photovoltaic cells, where NiO layers act as hole transport materials, improving efficiency. The material is also used in gas sensors and transparent conductive oxides (TCOs) for displays and touch panels.
Safety and Storage
While nickel oxide is not highly toxic, inhalation of its dust can cause respiratory irritation. Proper personal protective equipment (PPE), including masks and gloves, should be used during handling. The material should be stored in a dry environment to prevent moisture absorption, which can affect its performance. Disposal of NiO waste should follow local regulations for metal oxides. Large quantities may require special handling due to potential environmental concerns. Always consult safety data sheets (SDS) for specific guidance.
B2B Procurement Guide
When purchasing sputtering nickel oxide targets, specify the required purity (typically 99.9% or 99.99%), dimensions, and whether the target needs bonding to a backing plate. Consider the grain size and density of the target material, as these affect film quality and deposition rates. Lead times for custom targets can be several weeks, so plan accordingly. Request certificates of analysis (CoA) for each batch to verify composition and purity. For reference, prices commonly range from $200 to $500 per kilogram, depending on specifications and order volume.
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