Aicaigou LogoB2B WikiIndustrial Encyclopedia

Iron Oxide Sputtering Target

Updated: 2026-08-21

Overview

Iron oxide sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes to create thin films. These targets are typically composed of Fe2O3 and are essential in industries requiring precise thin-film coatings. Their ability to produce uniform and high-quality films makes them indispensable in advanced manufacturing and research. Sputtering targets like iron oxide are critical in applications ranging from semiconductor fabrication to optical coatings. The targets are manufactured through processes such as hot pressing or sintering to achieve the desired density and purity. Proper handling and storage are crucial to maintain their performance and longevity.

Physical and Chemical Properties

科研甄选 三氧化二铁靶材 陶瓷靶材 φ76.2×3mm 半导体镀膜材料河北宏钜金属材料有限公司

Iron oxide (Fe2O3) sputtering targets exhibit a dark red or brown appearance and are known for their high density (5.24 g/cm³) and thermal stability. They have a melting point of 1565 °C and are insoluble in water, making them suitable for high-temperature applications. The chemical stability of Fe2O3 ensures minimal reactivity during the sputtering process, which is vital for producing consistent thin films. The targets are also characterized by their excellent electrical and magnetic properties, which are leveraged in various high-tech applications.

商家经验真实案例 · 安全可信
硼的奇妙用途大揭秘
本文介绍硼的多种用途,从农业到工业,从日常清洁到特殊材料制造,硼都发挥着重要作用,展现了其独特的化学性质和广泛的应用价值。

Main Applications

Iron oxide sputtering targets are primarily used in the semiconductor industry for depositing thin films on silicon wafers. These films are integral to the fabrication of microelectronic devices. Additionally, they are employed in optical coatings to enhance the reflective or anti-reflective properties of lenses and mirrors. Another significant application is in magnetic storage devices, where Fe2O3 films contribute to data storage capabilities. Research institutions also use these targets for experimental purposes, such as studying magnetic properties or developing new materials.

Safety and Storage

高纯电解铬片 铬粉 金属铬 Cr 纯度99.97% 兴荣源现货北京兴荣源科技有限公司

Handling iron oxide sputtering targets requires caution to avoid inhalation of dust particles, which can be harmful. Protective equipment such as gloves and masks should be used during processing. The targets should be stored in a dry, cool environment to prevent oxidation or moisture absorption. Proper storage conditions are essential to maintain the target's integrity and performance. Any contamination can negatively affect the sputtering process, leading to suboptimal thin-film quality. Always follow manufacturer guidelines for storage and handling.

商家经验真实案例 · 安全可信
碳化钛形成的条件
碳化钛的形成依赖高温、碳源与钛元素的精准配比以及反应环境控制。本文详解其三大核心条件:温度阈值、原料配比关系及反应气氛选择,并探讨工业制备中的关键控制要点。

B2B Procurement Guide

When procuring iron oxide sputtering targets, it is crucial to specify purity levels, typically 99.9% or higher, depending on the application. Dimensions and bonding requirements (e.g., bonded to a backing plate) should also be clearly outlined to ensure compatibility with sputtering systems. Suppliers often provide custom fabrication services to meet specific requirements. Pricing varies based on purity, size, and quantity, with bulk purchases often attracting discounts. Always verify supplier credentials and request material certifications to guarantee quality.

Related Manufacturers