Overview
High-purity copper sputtering targets are specialized materials used in physical vapor deposition (PVD) processes to create thin, uniform copper films. These targets are manufactured through rigorous purification and forming techniques to achieve purity levels typically exceeding 99.99%, with some grades reaching 99.9999% for advanced semiconductor applications. In industrial settings, copper targets are preferred for their exceptional electrical conductivity (second only to silver among pure metals) and relatively low cost compared to precious metal alternatives. The targets are commonly fabricated as discs, rectangles, or other custom shapes to fit specific sputtering equipment configurations.
Physical and Chemical Properties
Copper sputtering targets exhibit characteristic metallic properties including high ductility, malleability, and face-centered cubic crystal structure. The high-purity versions demonstrate improved performance in thin film deposition due to reduced impurity scattering effects, yielding films with lower resistivity (approximately 1.67 μΩ·cm at 20°C). The material's thermal conductivity (401 W/m·K at 300K) makes it suitable for applications requiring efficient heat dissipation. Chemically, copper is relatively stable in dry air but forms a protective oxide layer when exposed to moisture, which can affect sputtering performance if not properly managed during storage and handling.
Main Applications
The primary application of high-purity copper targets lies in semiconductor manufacturing, where they are used to deposit interconnect layers in integrated circuits. The excellent electromigration resistance of copper makes it superior to aluminum for sub-100nm technology nodes. Additional applications include flat panel display manufacturing (for electrode layers), photovoltaic cells (as back contacts), and decorative coatings. In research settings, ultra-high purity copper targets (6N-7N) are employed for quantum computing components and specialized electronic devices where even trace impurities can significantly impact performance.
Safety and Storage
While metallic copper presents relatively low toxicity, the fine particles generated during target machining or sputtering can pose respiratory hazards. Proper ventilation and personal protective equipment (PPE) including N95 masks are recommended when handling these materials. Storage requires careful attention to prevent surface oxidation. Targets should be kept in vacuum-sealed packaging with desiccant when not in use, and stored in dry, inert gas environments for long-term preservation. Temperature fluctuations should be minimized to prevent thermal stress that could lead to microcracking in bonded targets.
B2B Procurement Guide
When procuring copper sputtering targets, buyers should specify purity level (typically 4N to 6N), dimensions, grain size requirements, and bonding method (for backed targets). Certification documents including material test reports (MTRs) and inductively coupled plasma (ICP) analysis reports are essential for quality verification. Lead times can vary significantly (4-12 weeks) depending on customization requirements. Consider supplier capabilities in precision machining, ultrasonic testing for bonding integrity, and ability to provide custom geometries. For high-volume purchases, negotiate based on batch consistency rather than just unit price.
Related Manufacturers
- 主营：氧化铝陶瓷、氧化锆陶瓷、工业陶瓷、溅射靶材、钛靶材、镍靶材、ITO靶材、99氧化铝陶瓷、蒸发材料、镀膜材料、耐高温陶瓷、铝塑膜、坩埚、陶瓷板、铝型材、绝缘陶瓷、铜背板、包装膜、防静电陶瓷、石墨坩埚、陶瓷垫圈、陶瓷零件、可加工陶瓷、微晶玻璃陶瓷
- 主营：圆钢棒、圆锻件、钢板材、锂靶材、钽靶材、合金靶材、光棒车、研磨棒、复合板、挡渣板、钢棒材、圆棒材、圆棒料、无缝管、精密管、螺丝钉、合金板、时效钢、合金棒料、不锈钢板、膨胀合金、电热合金、六角螺母、热轧钢板、六角螺栓
- 主营：靶材、溅射镀膜材料、颗粒、粉末、光学材料
- 主营：铬靶、合金熔炼、轧制、镍铬合金靶材、镍钒合金靶材、镍铜合金靶材、二硼化钛靶材、钛硅合金靶材、钛铝合金靶材、钛靶材、钴铬镍合金靶材、石墨靶材、铜合金靶材、镍合金靶材、铬合金靶材、锻造、锰铜阻尼合金、M2052、熔炼加工服务、钨镍铁合金、高熵合金、铝合金熔炼、镍合金熔炼、铜合金熔炼、钴铬钼合金
- 主营：溅射靶材、合金靶材、特殊合金、高纯材料、试样加工
- 主营：硼化锆、氟化镁、硒化锌、fto靶材、钐靶材、硒靶材、铝靶材、钆靶材、铽靶材、钇靶材、钼靶材、铬靶材、镉靶材、钽靶材、镍靶材、钨靶材、铑靶材、铒靶材、铪靶材、锑靶材、氟化镱、砷化镓、硒化锑、碲化镉、碲粉末
- 主营：引出线、钼坩埚、钼顶头、半导体溅射靶材、钼工装料架、钨坩埚、钨顶头、钨流口、钨钼加工件、钽铌钒锆铪
- 主营：合金靶材、陶瓷靶材、金属靶材、高纯合金靶材、铜靶材、银靶材、铝靶材、锂靶材、高纯银靶材、镍铜合金靶材、溅射靶、铬靶材、锆靶材、氧化铟镓锌靶材、铱靶材、铂靶材、硫酸钠靶材、二氧化硅靶材、氧化镁靶材、钛铌合金靶材、钼钽合金靶材、碲化锑靶材、单质金属靶
- 主营：铌钛靶、铝硅靶、纽扣锭、钴靶材、硅靶材、镍钼靶、合金靶、定制金、钛硅靶、镍铁锰、镍铬靶、铁合金、铜镍靶、镍铁靶、镓合金、镁合金、合金板、铜合金、母合金、钛镍棒、铝钴铬、合金锭、铝合金、铁镓靶、合金棒
- 主营：感应熔炼、4822、中间合金、合金靶材、钛铝、实验钢、熔炼钛铝、高温合金、钴铬钼、铝铌、高熵合金、TNM、悬浮熔炼、难熔合金、镍钛、钛合金、铝合金、镁合金、铜合金、镍合金、钴合金、铌合金、锆合金、高纯铝、镍基合金
- 主营：镀膜材料、稀土金属、稀土材料、陶瓷靶材、实验靶材、溅射靶材、磁控溅射、合金靶材、靶材定制、靶材、半导体材料、高纯材料
- 主营：高纯金属材料、合金熔炼材料、Au-高纯金颗粒、高纯铜颗粒、Ag-高纯银颗粒、高纯铝颗粒-Al、Ti-高纯钛粒、Ni-高纯镍颗粒、Cr-高纯铬颗粒、Mg-镁粒、Mo-钼颗粒、Si-硅颗粒、Ag-银靶
- 主营：纳米铂粉、纳米氧化锌粉末、高纯超细铜粉、钛锆铪钨铌、纳米氧化铝、钛颗粒、钴铬镍铝钛合金、纳米铁粉、纳米氮化硅、氧化铋、高纯超细钒粉、钴粉、纳米硅粉、碳化钨、锰颗粒、碳化铬粉、钴铬铁镍铝、钛粉、碳化硼、高纯超细钼粉、铜颗粒、金属钙颗粒、纳米锡粉、超细氧化锌、纳米氧化锆
- 主营：溅射靶材、高熵合金、科研合金、高纯金属
- 主营：五氧化二铌矩形靶、5N锰颗粒、钛酸锶衬底、铝钪合金靶材、氧化锌铝靶材、ITO靶材、高纯银颗粒、高纯铪颗粒、石墨粉末、导电氮化硼坩埚、球形粉末、球形铜粉、镀金硅片、高纯钛片、钕颗粒、晶振片、键合金丝