Overview
Gold sputtering targets are specialized materials used in physical vapor deposition (PVD) systems to create thin, uniform gold coatings. These targets are fabricated from high-purity gold (typically 99.95% to 99.999%) to ensure minimal impurities during the sputtering process. In industrial settings, gold targets are critical for applications requiring superior electrical conductivity, corrosion resistance, and biocompatibility. The targets are commonly available in disk or rectangular forms, with thicknesses ranging from 0.1mm to 10mm, depending on the sputtering system requirements.
Physical and Chemical Properties
Gold sputtering targets exhibit exceptional physical properties, including a density of 19.32 g/cm³ and a melting point of 1064°C. Their high ductility allows for precise machining into various shapes without cracking. Chemically, gold is inert to most acids (except aqua regia) and oxidizers, making it suitable for harsh environments. The material's reflectivity (>95% for infrared light) and low electrical resistivity (2.44 μΩ·cm) are leveraged in optical and electronic applications.
Main Applications
In semiconductor manufacturing, gold targets deposit interconnect layers for high-frequency devices. The medical industry uses them for implantable device coatings due to gold's biocompatibility. Optical applications include infrared reflectors and spacecraft thermal control coatings. Emerging uses span quantum computing components and advanced sensor arrays, where gold's stable performance at nanoscale thicknesses is essential.
Safety and Storage
While elemental gold is non-toxic, targets require careful handling to prevent surface contamination from fingerprints or particulates. Always use powder-free nitrile gloves in cleanroom environments. Store targets in vacuum-sealed bags with desiccants, ideally in argon-filled containers. Avoid contact with halogens or mercury, which can form amalgams. For bonded targets, verify the integrity of the backing plate interface before use.
B2B Procurement Guide
When sourcing gold sputtering targets, specify the purity level (e.g., 4N5 for 99.995%), dimensions (±0.05mm tolerance), and surface roughness (typically <0.5μm Ra). Backed targets with molybdenum or copper plates improve heat dissipation for high-power applications. Lead times for custom targets range from 2-6 weeks. Consider suppliers with ISO 9001 certification and ask for material test reports (MTRs) with traceable lot numbers. For prototyping, some vendors offer target reclaim services to reduce costs.
Related Manufacturers
- 主营：玻璃镀膜、光学镀膜机、真空镀膜设备、溅射镀膜机、镀膜玻璃设备
- 主营：氧化铋、高纯碲块、金属铟锭、铋靶材、液态金属、金属铟、金属锗、二氧化碲、真空镀膜、铋粉、碲化铋棒材、低熔点合金、碲粒、铟粒、铋珠铋粒、镓铟锡合金、锗粉、铟丝、铟片铟箔、三氧化二铋、碲化铋、铟珠铟粒、低熔点焊料、铋锭
- 主营：氧化铝陶瓷、氧化锆陶瓷、工业陶瓷、溅射靶材、钛靶材、镍靶材、ITO靶材、99氧化铝陶瓷、蒸发材料、镀膜材料、耐高温陶瓷、铝塑膜、坩埚、陶瓷板、铝型材、绝缘陶瓷、铜背板、包装膜、防静电陶瓷、石墨坩埚、陶瓷垫圈、陶瓷零件、可加工陶瓷、微晶玻璃陶瓷
- 主营：镍法兰、镍坩埚、镍铜棒、镍弯头、ta2钛卷、ta1钛棒、镍板能、换热管、镍卷带、钛卷带、镍圆棒、n6镍螺丝、n4镍管件、n4镍合金、n5厚壁管、钛合金环、高纯镍板、电解镍板、镍基焊丝、电镀镍板、纯镍管件、超细镍丝、镍合金棒、钛合金管、高纯镍管
- 主营：7n5锑棒、高纯铟、7n8n镉棒、金靶材、高纯碲块、氧化铟、7n5砷棒、氧化镓、氧化铋、氧化物、高纯铝、高纯磷、锑化铟、氧化锑、碲化铋、催化剂、镀膜材料、碲锌镉、金属铜、氧化钪、红外材料、二氧化锗、高纯碲丸、二氧化硅、高纯碲锭、金属颗粒
- 主营：高熵合金、合金定制、球形粉末、靶材、磁控溅射靶材、金靶材、合金粉末、真空熔炼、镍钛合金、中间合金、3D打印合金粉、钽合金、科研合金、悬浮熔炼、感应熔炼、熔炼代工、增材制造粉末、纽扣锭、合金板、合金棒、电弧熔炼、钴铬镍合金
- 主营：陶瓷靶材、磁控溅射靶材、金属靶材、合金靶材、真空镀膜、导电薄膜、高纯材料
- 主营：靶材、溅射镀膜材料、颗粒、粉末、光学材料
- 主营：合金靶材、陶瓷靶材、金属靶材、高纯合金靶材、铜靶材、银靶材、铝靶材、锂靶材、高纯银靶材、镍铜合金靶材、溅射靶、铬靶材、锆靶材、氧化铟镓锌靶材、铱靶材、铂靶材、硫酸钠靶材、二氧化硅靶材、氧化镁靶材、钛铌合金靶材、钼钽合金靶材、碲化锑靶材、单质金属靶
- 主营：溅射靶材、合金靶材、特殊合金、高纯材料、试样加工
- 主营：钽板、钽管、钽棒、钽靶材、铌靶材、钒靶材、钽丝、铌板、铌管、铌棒、钽加工件、铌丝、铌加工件、钒板、钒棒、钒丝、钽坩埚、钽接地环、钽保护管、钽箔、铌坩埚、铌箔、钒箔、钽异形件
- 主营：微焦点、治疗监测仪、环境监测仪、x射线管、便携x射线、x射线平板探测器、辐射剂量仪、测厚用x射线管、固定式阳极x、工业高压电缆、x光管、便携平板探测器
- 主营：高纯钨钼、钨镍铁 钨镍铜、热处理工装料架、真空炉组件、玻璃窑炉钼电极、钨钼锆钛坩埚、钨钼电极棒、钼顶头、钨钼流口、钨钼钽铌锆钛各类加工件、钼加热带隔热屏、钨丝钼丝、热电偶保护管、TZM合金、钼加热丝、钨网发热体、钼镧合金管、镧钨合金
- 主营：高温合金、镍基合金、钛合金、哈氏合金、模具钢、沉淀硬化钢、不锈钢、双相不锈钢、特殊合金、钽合金、铌合金、锆合金、板材、棒材、管材、锻件、无缝管、按图加工
- 主营：钛溅射靶材、高温镍基合金、哈市合金、蒙乃尔合金