Overview
Copper Titanium sputtering targets are specialized materials designed for physical vapor deposition (PVD) processes, particularly magnetron sputtering. These targets combine the excellent electrical conductivity of copper with the mechanical strength and corrosion resistance of titanium, making them ideal for creating durable, high-performance thin films. The alloy composition can be customized, with common ratios including Cu90Ti10 and Cu80Ti20, depending on the desired film properties. In industrial applications, Cu-Ti targets are valued for their ability to produce films with superior adhesion to substrates compared to pure copper targets. The titanium component enhances the film's durability while maintaining good electrical characteristics. These targets are manufactured through precision casting or powder metallurgy processes to ensure uniform composition and microstructure.
Physical and Chemical Properties
Copper Titanium targets exhibit a unique combination of properties derived from their constituent metals. The copper component provides high electrical conductivity (approximately 58 MS/m at 20°C) and thermal conductivity (401 W/m·K), while titanium contributes exceptional mechanical strength (tensile strength up to 1,000 MPa in alloys) and corrosion resistance. The density of Cu-Ti alloys typically ranges between 6-8 g/cm³, depending on the titanium content. Chemically, these alloys maintain good stability under standard conditions but may oxidize at elevated temperatures. The melting point varies with composition but generally falls between the melting points of pure copper (1083°C) and titanium (1668°C). In thin film form, Cu-Ti coatings demonstrate excellent adhesion to various substrates including glass, silicon, and polymers, with typical film thicknesses ranging from 50 nm to several micrometers.
Main Applications
The primary application of Copper Titanium sputtering targets is in the semiconductor industry, where they are used to deposit conductive layers in integrated circuits and microelectronic devices. The alloy's combination of conductivity and durability makes it particularly suitable for bonding pads and interconnects that require both electrical performance and mechanical reliability. In the optical coatings sector, Cu-Ti targets are employed to create decorative and functional coatings for architectural glass, automotive components, and consumer electronics. The titanium content allows for color tuning of the coatings while maintaining good reflectivity. Additionally, these targets find use in research laboratories for developing advanced materials and in the aerospace industry for specialized component coatings that must withstand harsh environments.
Safety and Storage
While Copper Titanium targets are generally safe in their solid form, proper handling precautions are necessary during machining and installation. When cutting or grinding targets, appropriate personal protective equipment (PPE) including dust masks and safety glasses should be worn to prevent inhalation of metal particles. The fine dust generated can be combustible under certain conditions, requiring proper ventilation and dust collection systems. For storage, Cu-Ti targets should be kept in sealed, moisture-proof packaging with desiccants to prevent oxidation. Ideal storage conditions include a dry, temperature-controlled environment (15-25°C) with relative humidity below 60%. Targets should be handled with clean gloves to avoid surface contamination, as even minor impurities can affect sputtering performance. For long-term storage, argon-filled packaging is recommended for high-purity targets.
B2B Procurement Guide
When procuring Copper Titanium sputtering targets, buyers should specify several critical parameters to ensure optimal performance. The alloy composition (typically expressed as Cu100-xTix where x ranges from 5 to 30) must be clearly defined, as it directly affects the film properties. Target dimensions (diameter and thickness for discs, length/width/thickness for rectangular targets) should match the sputtering system's requirements with tight tolerances (usually ±0.1 mm). Purity requirements should be specified, with 99.9% (3N) being common for general applications and 99.999% (5N) for advanced semiconductor uses. Surface finish (typically Ra < 0.8 μm) and bulk density (>95% of theoretical) are important quality indicators. Lead times for custom targets can range from 4-12 weeks depending on complexity and quantity. Buyers should request certification of analysis and consider suppliers with ISO 9001 certification for quality assurance.
Related Manufacturers
- 主营：清靶灰、铟丝珠、锡膏废、靶材废、钼靶材、废铜板、钽靶材、铟上门、镍回收、硅管废、山铟废、铟金属、回收ito、废金属、铟废料、废锡线、铟合金、废铟箔、ito颗粒、收购镍、粗铟回收、铟渣回收、钛管回收、铟粉铟渣、铟粉铟渣采购
- 主营：圆钢棒、圆锻件、钢板材、锂靶材、钽靶材、合金靶材、光棒车、研磨棒、复合板、挡渣板、钢棒材、圆棒材、圆棒料、无缝管、精密管、螺丝钉、合金板、时效钢、合金棒料、不锈钢板、膨胀合金、电热合金、六角螺母、热轧钢板、六角螺栓
- 主营：溅射靶材、合金靶材、特殊合金、高纯材料、试样加工
- 主营：铬靶、合金熔炼、轧制、镍铬合金靶材、镍钒合金靶材、镍铜合金靶材、二硼化钛靶材、钛硅合金靶材、钛铝合金靶材、锰铜阻尼合金、钛靶材、钴铬镍合金靶材、铜合金熔炼、石墨靶材、铜合金靶材、镍合金靶材、铬合金靶材、锻造、M2052、熔炼加工服务、钨镍铁合金、高熵合金、铝合金熔炼、镍合金熔炼、钴铬钼合金
- 主营：金属靶材、合金靶材、陶瓷靶材、蒸发颗粒
- 主营：溅射靶材、高熵合金、科研合金、高纯金属
- 主营：合金靶材、陶瓷靶材、金属靶材、高纯合金靶材、铜靶材、银靶材、铝靶材、锂靶材、高纯银靶材、镍铜合金靶材、铬靶材、锆靶材、氧化铟镓锌靶材、铱靶材、铂靶材、硫酸钠靶材、二氧化硅靶材、氧化镁靶材、钛铌合金靶材、钼钽合金靶材、碲化锑靶材、单质金属靶、溅射靶
- 主营：导热材料、屏蔽材料、导电银浆、镀镍铜合金氧化铝、柔性电极材料、导电银胶、金浆、导电橡胶、镀银导电布、金粉、铂电极浆料、FPC软板、镀金导电布、银钯浆料、电阻浆料、导热相变材料、柔性电极
- 主营：锆铝靶材、高温镍基合金
- 主营：硼化锆、氟化镁、硒化锌、fto靶材、钐靶材、硒靶材、铝靶材、钆靶材、铽靶材、钇靶材、钼靶材、铬靶材、镉靶材、钽靶材、镍靶材、钨靶材、铑靶材、铒靶材、铪靶材、锑靶材、氟化镱、砷化镓、硒化锑、碲化镉、碲粉末
- 主营：高纯金属材料、合金熔炼材料、Au-高纯金颗粒、高纯铜颗粒、Ag-高纯银颗粒、高纯铝颗粒-Al、Ti-高纯钛粒、Ni-高纯镍颗粒、Cr-高纯铬颗粒、Mg-镁粒、Mo-钼颗粒、Si-硅颗粒、Ag-银靶
- 主营：金属铝、镀膜机、银颗粒、陶瓷环、硫化锌、高纯材料、镀膜材料、金属铬颗粒、石墨加热器、电子枪枪头、高纯度锡粒、镀膜金属材料、金属镍铬合金、镍铬合金颗粒、光学镀膜材料、镀膜机配件、二氧化锆
- 主营：高熵合金、合金定制、球形粉末、靶材、磁控溅射靶材、金靶材、合金粉末、真空熔炼、镍钛合金、中间合金、3D打印合金粉、钽合金、科研合金、悬浮熔炼、感应熔炼、熔炼代工、增材制造粉末、纽扣锭、合金板、合金棒、电弧熔炼、钴铬镍合金
- 主营：铜粉、高纯硒粉、高纯硅粉、进口硒粉
- 主营：五氧化二铌矩形靶、5N锰颗粒、钛酸锶衬底、铝钪合金靶材、氧化锌铝靶材、球形铜粉、ITO靶材、高纯银颗粒、高纯铪颗粒、石墨粉末、导电氮化硼坩埚、球形粉末、镀金硅片、高纯钛片、钕颗粒、晶振片、键合金丝