Overview
Antimony oxide sputtering targets are specialized materials used in physical vapor deposition (PVD) processes, particularly in magnetron sputtering systems. These targets consist of high-purity antimony trioxide (Sb2O3) compressed into dense forms suitable for controlled vaporization. Primarily employed in thin-film technology, these targets enable the deposition of antimony oxide layers with precise thickness and uniformity. The material's unique combination of optical and electrical properties makes it valuable for advanced applications in electronics and coatings.
Physical and Chemical Properties
Antimony oxide targets exhibit several distinctive characteristics that make them suitable for sputtering applications. With a density ranging from 5.2 to 5.8 g/cm³, these targets provide sufficient mass for efficient sputtering while maintaining structural integrity during the deposition process. The material demonstrates excellent thermal stability, with a melting point of 656°C and boiling point of 1425°C. These properties allow for stable operation in high-temperature vacuum environments. Chemically, Sb2O3 is relatively inert but can react with strong acids or reducing agents under certain conditions.
Main Applications
The primary use of antimony oxide sputtering targets is in the production of transparent conductive oxides (TCOs) for display technologies and photovoltaic cells. When doped with other elements, Sb2O3 films can achieve specific electrical and optical characteristics. Additional applications include infrared-reflective coatings for energy-efficient windows and flame-retardant layers for specialized packaging materials. The semiconductor industry utilizes these targets for creating dielectric layers in certain microelectronic components.
Safety and Storage
Proper handling of antimony oxide targets requires attention to safety protocols. While the material is generally stable, inhalation of dust particles should be prevented through the use of appropriate respiratory protection and engineering controls like fume hoods. Storage conditions should maintain targets in a dry environment to prevent moisture absorption, which could affect sputtering performance. Targets should be kept in inert gas environments or vacuum-sealed packaging when not in immediate use to preserve surface quality.
B2B Procurement Guide
When sourcing antimony oxide sputtering targets, buyers should prioritize suppliers with demonstrated expertise in target manufacturing. Key specifications to verify include purity levels (typically ≥99.9%), density uniformity, and dimensional tolerances that match your deposition system requirements. Consider the target's bonding method (e.g., soldered or clamped) and whether it meets your production throughput demands. Lead times can vary significantly based on customization needs, so plan procurement accordingly. For reference, prices typically range from $500 to $2000 per kilogram depending on purity and geometric complexity.
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